000 | 00957nam#a2200217ua#4500 | ||
---|---|---|---|
008 | 980504s1999 nyua b 001 0 eng | ||
020 | _a9780471242475 | ||
082 |
_a541.345 _bEv15C |
||
100 |
_aEvans, D. Fennell. _99835 |
||
245 |
_aThe Colloidal Domain _bWhere physics, chemistry, biology, and technology meet _cby Fennell Evans and Hakan Wennerstrom. |
||
250 | _a2nd ed. | ||
260 |
_aNew York _bWiley-VCH _cc1999. |
||
300 |
_axl, 632 p. _bill. _c26 cm. |
||
440 |
_aAdvances in interfacial engineering series _99836 |
||
504 | _aIncludes bibliographical references (p. xxxi) and index. | ||
650 |
_aColloids. _99837 |
||
650 |
_aSurface chemistry. _99838 |
||
856 | 4 | 2 |
_3Contributor biographical information _uhttp://www.loc.gov/catdir/bios/wiley041/98023227.html |
856 | 4 | 2 |
_3Publisher description _uhttp://www.loc.gov/catdir/description/wiley032/98023227.html |
856 | 4 |
_3Table of Contents _uhttp://www.loc.gov/catdir/toc/onix03/98023227.html |
|
999 |
_c9726 _d9726 |