000			02203nmm a22004338i 4500
005			20230705152723.0
008			190607s2019 nju ob 001 0 eng
010			_a 2019023207
015			_aGBB9E7484 _2bnb
016	7		_a019521176 _2Uk
020			_a9781119417644 _q(epub)
020			_a1119417643
020			_a9781119417620 _q(adobe pdf)
020			_a1119417627
020			_z9781119417583 _q(cloth)
020			_a9781119417651 _q(electronic bk.)
020			_a1119417651 _q(electronic bk.)
020			_z1119417589
037			_a9781119417644 _bWiley
082			_a620/.44 _223
100			_aWatts, John F., _eauthor. _922125
245	1	3	_aAn introduction to surface analysis by XPS and AES / _cJohn F Watts, The Surface Analysis Laboratory, Department of Mechanical Engineering Sciences, University of Surrey, John Wolstenholme.
250			_aSecond edition.
263			_a1910
260			_aHoboken : _bWiley, _c2019.
300			_a1 online resource
504			_aIncludes bibliographical references and index.
520			_a"The year of publication (2019) is the Golden Jubilee of the launch of XPS and AES as commercially available analysis methods. It is a rather salutary though that both of us have been involved with applied surface analysis for more than three quarters of this time, which gives us both cause to reflect on the many innovations that have taken place during this time. As a celebration of 50 years of XPS we include images of one of the first commercial XPS systems and a sectioned analyser from such a system, overleaf"-- _cProvided by publisher.
650			_aSurfaces (Technology) _xAnalysis. _922126
650			_aElectron spectroscopy. _922127
650			_aPhotoelectron spectroscopy. _922128
650			_aAuger effect. _922129
650			_aAuger effect. _2fast _0(OCoLC)fst00821304 _922129
650			_aElectron spectroscopy. _2fast _0(OCoLC)fst00906707 _922127
650			_aPhotoelectron spectroscopy. _2fast _0(OCoLC)fst01061561 _922128
650			_aSurfaces (Technology) _xAnalysis. _2fast _0(OCoLC)fst01139279 _922126
700			_aWolstenholme, John, _eauthor. _922130
856			_uhttps://doi.org/10.1002/9781119417651 _zWiley Online Library
999			_c13825 _d13825