000 01548nmm a2200361Ii 4500
005 20230705152723.0
008 181219s2019 nju o 001 0 eng d
020 _a9781119311447
_q(electronic bk.)
020 _a1119311446
_q(electronic bk.)
020 _a9781119311478
_q(electronic bk. ;
_qoBook)
020 _a1119311470
_q(electronic bk. ;
_qoBook)
020 _a1119089115
020 _a9781119089117
020 _z9781119089117
072 7 _aSCI
_x013060
_2bisacsh
072 7 _aTEC
_x009010
_2bisacsh
082 _a660.2812
_223
100 _aHaydary, Juma,
_eauthor.
_922087
245 _aChemical process design and simulation :
_bAspen Plus and Aspen Hysys applications /
_cJuma Haydary.
260 _aHoboken, NJ :
_bJohn Wiley & Sons, Inc. :
_bAmerican Institute of Chemical Engineers,
_c2019.
300 _a1 online resource
500 _aIncludes index.
650 _aChemical processes.
_922088
650 _aChemical processes
_xComputer simulation.
_922089
650 _aChemical engineering.
_922090
650 _aChemical engineering
_xComputer simulation.
_922091
650 _aSCIENCE
_xChemistry
_xIndustrial & Technical.
_2bisacsh
_922092
650 _aTECHNOLOGY & ENGINEERING
_xChemical & Biochemical.
_2bisacsh
_922093
650 _aChemical engineering.
_2fast
_0(OCoLC)fst00852893
_922090
650 _aChemical processes.
_2fast
_0(OCoLC)fst00853156
_922088
650 _aChemical processes
_xComputer simulation.
_2fast
_0(OCoLC)fst00853160
_922089
856 _uhttps://doi.org/10.1002/9781119311478
_zWiley Online Library
999 _c13818
_d13818