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Chemical process design and simulation : Aspen Plus and Aspen Hysys applications / Juma Haydary.

By: Material type: Computer fileComputer filePublication details: Hoboken, NJ : John Wiley & Sons, Inc. : American Institute of Chemical Engineers, 2019.Description: 1 online resourceISBN:
  • 9781119311447
  • 1119311446
  • 9781119311478
  • 1119311470
  • 1119089115
  • 9781119089117
Subject(s): DDC classification:
  • 660.2812 23
Online resources:
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